IndiNaPoly - Customized nanotechnological polymer platform for large-scale production of future semiconductor generations

Lithography is crucial for the manufacture of electronic semiconductors. New resists with high sensitivity and resolution are needed to increase component density and cope with mass production. With the IndiNaPoly project, Fraunhofer researchers aim to support the chemical industry in gaining a technological edge and tapping into new markets. Resist manufacturers are an important link in the semiconductor industry. Manufacturers of specialty polymers and semiconductors also benefit from the results.

Closing the gap between sensitivity and resolution in lithography with chemical and process engineering expertise

The project addresses challenges posed by new technologies such as artificial intelligence, quantum computing, 5G, and the Internet of Things. The focus is on developing more sensitive resists for electron beam lithography. These enable high-resolution imaging of nanoscale structures with shorter exposure times. IndiNaPoly closes the gap between sensitivity and resolution in lithography, which requires chemical and process engineering expertise.

The project goals are achieved through individual polymer synthesis and continuous optimization of the lithographic process steps. Higher resolutions and shorter exposure times contribute to energy savings and a reduction in the compliance office footprint.

Fraunhofer LBF is concentrating on the development of new polymer materials. The focus is on improving imaging properties and faster, sustainable synthesis strategies. Other properties such as adhesion, etch stability, and environmental compatibility are also being considered.